Using mesoporous SiO2 to encapsulate CsPbBr3 nanocrystals is one of the best strategies to exploit such materials in devices. However, the CsPbBr3/SiO2 composites produced so far do not exhibit strong ...

Institute of Microelectronics, Chinese Academy of Sciences, Beijing, China School of Integrated Circuits, University of Chinese Academy of Sciences, Beijing, China Atomic Layer Deposition,Metal ...

Femtosecond laser micromachining was first demonstrated in 1994, when a femtosecond laser was used to ablate micrometre-sized features on silica and silver surfaces 1,2. In less than ten years the ...

Atomic Layer Deposition,Ferroelectric Field-effect Transistor,Gate Stack,Charge Trapping,Metal Gate,Ferroelectric Polarization,Memory Window,Physical Vapor Deposition,Ferroelectric ...